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New Technologies for Microanalysis and Element Imaging in THJ Scanning Electron Microscope

Published online by Cambridge University Press:  02 July 2020

Paul Smith
Affiliation:
RÖNTEC USA, Inc., Acton, MA;
John Gannon
Affiliation:
RÖNTEC USA, Inc., Acton, MA;
Frank Eggert
Affiliation:
RÖNTEC GmbH, Berlin, Germany.
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Abstract

RÖNTEC’s UHV Dewar detectors have established new standards for high resolution, lowmaintenance, low operating cost, and reliability in Si(Li) X-ray detectors. Now, the recently introduced XFlash® series X-ray detectors are enabling new methodologies for microanalysis and element imaging in the SEM. These detectors are compact, liquid-nitrogen-free semiconductor Xray detectors that are based on Silicon Drift Diode (SDD) technology. XFlash detectors produce extraordinarily high count rates with excellent energy resolution and have introduced ultra-fast microanalysis and element mapping to the SEM world. The addition of color to SEM images enables easy visualization of element distributions and allows the microstructural features and compositional variations of different materials to be more readily identified. Persons unfamiliar with electron microscopy can more readily interpret color images than black and white or gray scale images. This new technology has great potential to revolutionize electron microscopy.

RÖNTEC’s UHV Dewar Detector offers the highest long-term stability and best energy resolution ever specified for a commercial Si(Li) detector (less than 129 eV). The UHV design leads to small size and weight (for reduced column loading) along with extremely low nitrogen consumption and low susceptibility to microphonics. The UHV detector never ices up and thus never requires defrosting or warm-ups. It is available with a variety of entrance windows for light element analysis.

Type
Corporate Session (Organized by M. Kersker)
Copyright
Copyright © Microscopy Society of America 2001

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References

references

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