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A New Silicon Drift Detector for High Spatial Resolution STEM-XEDS: Performance and Applications

Published online by Cambridge University Press:  29 July 2014

Patrick J. Phillips*
Affiliation:
Department of Physics, University of Illinois at Chicago, 845 W Taylor Street, Chicago, IL 60607, USA
Tadas Paulauskas
Affiliation:
Department of Physics, University of Illinois at Chicago, 845 W Taylor Street, Chicago, IL 60607, USA
Neil Rowlands
Affiliation:
Oxford Instruments NanoAnalysis, Halifax Road, High Wycombe, HP12 3SE, UK
Alan W. Nicholls
Affiliation:
Research Resources Center, University of Illinois at Chicago, 845 W Taylor Street, Chicago, IL 60607, USA
Ke-Bin Low
Affiliation:
BASF, 25 Middlesex/Essex Turnpike, Iselin, NJ 08830, USA
Santokh Bhadare
Affiliation:
Oxford Instruments NanoAnalysis, Halifax Road, High Wycombe, HP12 3SE, UK
Robert F. Klie
Affiliation:
Department of Physics, University of Illinois at Chicago, 845 W Taylor Street, Chicago, IL 60607, USA
*
*Corresponding author. Email: [email protected]
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Abstract

A newly designed, 100 mm2, silicon drift detector has been installed on an aberration-corrected scanning transmission electron microscope equipped with an ultra-high resolution pole piece, without requiring column modifications. With its unique, windowless design, the detector’s active region is in close proximity to the sample, resulting in a dramatic increase in count rate, while demonstrating an increased sensitivity to low energy X-rays and a muted tilt dependence. Numerous examples of X-ray energy dispersive spectrometry are presented on relevant materials such as AlxGa1−xN nanowires, perovskite oxides, and polycrystalline CdTe thin films, across both varying length scales and accelerating voltages.

Type
FEMMS Special Issue
Copyright
© Microscopy Society of America 2014 

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