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New FESEM Design for 1nm at 1kV Imaging, EDS and BSE Nanoanalysis, and a Discussion of Diffraction Limits, Depth of Field and the Future

Published online by Cambridge University Press:  01 November 2002

E D Boyes*
Affiliation:
DuPont Company, CR&D, PO Box 80356-383, Wilmington, DE 19880-0356, USA

Abstract

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Abstract
Copyright
Copyright © Microscopy Society of America 2002