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Nanopillar Fabrication with Focused Ion Beam Cutting

Published online by Cambridge University Press:  04 July 2014

Oleksii V. Kuzmin ,
Yutao T. Pei  and
Jeff T.M. De Hosson
Oleksii V. Kuzmin
Affiliation:
Materials Innovation Institute (M2i), Department of Applied Physics, Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, 9747 AG Groningen, The Netherlands
Yutao T. Pei*
Affiliation:
Materials Innovation Institute (M2i), Department of Applied Physics, Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, 9747 AG Groningen, The Netherlands
Jeff T.M. De Hosson
Affiliation:
Materials Innovation Institute (M2i), Department of Applied Physics, Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, 9747 AG Groningen, The Netherlands
*
*Corresponding author. [email protected]
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Abstract

A versatile method to fabricate taper-free micro-/nanopillars of large aspect ratio was developed with focused ion beam (FIB) cutting. The key features of the fabrication are a FIB with an incident angle of 90° to the long axis of the pillar that enables milling of the pillar sideways avoiding tapering and the FIB current can be reduced step by step so as to reduce possible radiation damage of the milled surface by Ga ions. A procedure to accurately determine the cross-section of each pillar was developed.

Keywords

nanopillarsfocused ion beammetallic glassTEM
Type
Instrumentation and Techniques Development
Information
Microscopy and Microanalysis , Volume 20 , Issue 5 , October 2014 , pp. 1581 - 1584
Copyright
© Microscopy Society of America 2014 

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References

Chen, C.Q., Pei, Y.T. & De Hosson, J.T.M. (2010). Effects of size on the mechanical response of metallic glasses investigated through in situ TEM bending and compression experiments. Acta Mater 58, 189–200.CrossRefGoogle Scholar
Chen, C.Q., Pei, Y.T., Kuzmin, O.V., Zhang, Z.F., Ma, E. & De Hosson, J.T.M. (2011). Intrinsic size effects in the mechanical response of taper-free nanopillars of metallic glass. Phys Rev B 83, 180201(R).CrossRefGoogle Scholar
De Hosson, J.T.M. (2009). Advances in transmission electron microscopy: In situ straining and in situ compression experiments on metallic glasses. Microsc Res Tech 72, 250–260.CrossRefGoogle ScholarPubMed
Gupta, J., Harper, J.M.E., Mauer, J.L., Blauner, P.G. & Smith, D.A. (1992). Focused ion bean imaging of grain growth in copper thin films. Appl Phys Lett 61, 663–665.CrossRefGoogle Scholar
Holzer, L., Indutnyi, F., Gasser, P.H., Münch, B. & Wegmann, M. (2004). Three-dimensional analysis of porous BaTiO3 ceramics using FIB nanotomography. J Microsc 21, 84–95.CrossRefGoogle Scholar
Khizroev, S. & Litvinov, D. (2004). Focused-ion-beam-based rapid prototyping of nanoscale magnetic devices. Nanotechnology 15, R7–R15.CrossRefGoogle Scholar
Kuzmin, O.V., Chen, C.Q., Pei, Y.T. & De Hosson, J.T.M. (2012 a). Intrinsic and extrinsic size effects in the deformation of metallic glass nanopillars. Acta Mater 60, 889–898.CrossRefGoogle Scholar
Kuzmin, O.V., Pei, Y.T. & De Hosson, J.T.M. (2011). In situ compression study of taper-free metallic glass nanopillars. Appl Phys Lett 98, 233104.CrossRefGoogle Scholar
Kuzmin, O.V., Pei, Y.T. & De Hosson, J.T.M. (2012 b). Size effects and ductility of Al-based metallic glass. Scripta Mater 67, 344–347.CrossRefGoogle Scholar
Mayer, J., Giannuzzi, L.A., Kamino, T. & Michael, J. (2007). TEM sample preparation and FIB-induced damage. MRS Bull 32, 400–407.CrossRefGoogle Scholar
Orloff, J. & Swanson, L. (1975). Study of a field-ionization source for microprobe applications. J Vac Sci Tech 12, 1209.CrossRefGoogle Scholar
Orloff, J., Swanson, L.W. & Utlaut, M. (1996). Fundamental limits on imaging resolution in focused ion beam systems. J Vac Sci Tech B 14, 3759–3763.CrossRefGoogle Scholar
Principe, E.L., Gnauck, P. & Hoffrogge, P. (2005). Final milling in a FIB-SEM instrument. Microsc Microanal 11, 830–831.Google Scholar
Seliger, R.L., Ward, J.W., Wang, V. & Kubena, R.L. (1979). A high-intensity scanning ion probe with submicrometer spot size. Appl Phys Lett 34, 310–312.CrossRefGoogle Scholar
Shukla, S., Seal, S., Akesson, J., Oder, R., Carter, R. & Rahman, Z. (2001). Study of mechanism of electroless copper coating of fly-ash cenosphere particles. Appl Surf Sci 181, 35–50.CrossRefGoogle Scholar
Volkert, C.A. & Minor, A.M. (2007). Focused ion beam microscopy and micromachining. MRS Bull 32, 389–395.CrossRefGoogle Scholar