Hostname: page-component-586b7cd67f-gb8f7 Total loading time: 0 Render date: 2024-11-25T14:38:20.725Z Has data issue: false hasContentIssue false
  • English
  • Français

NanoFab with SIMS - Recent Results from the BAM-L200 Analytical Standard and Semiconductor Samples

Published online by Cambridge University Press:  01 August 2018

Brett Lewis ,
Fouzia Khanom  and
John Notte
Brett Lewis
Affiliation:
Carl Zeiss Microscopy, One Corporation Way, Peabody, MA 01960, USA
Fouzia Khanom
Affiliation:
Carl Zeiss Microscopy, One Corporation Way, Peabody, MA 01960, USA
John Notte
Affiliation:
Carl Zeiss Microscopy, One Corporation Way, Peabody, MA 01960, USA

Abstract

An abstract is not available for this content so a preview has been provided. As you have access to this content, a full PDF is available via the ‘Save PDF’ action button.
Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Abstract
Information
Microscopy and Microanalysis , Volume 24 , Supplement S1: Proceedings of Microscopy & Microanalysis 2018 , August 2018 , pp. 850 - 851
Copyright
© Microscopy Society of America 2018 

References

[1] Hlawacek, G. Gölzhäuser, A. Helium Ion Microscopy. Springer 2017.Google Scholar
[2] Wirtz, T., Dowsett, D. Philipp, P. Helium Ion Microscopy (edited by G. Hlawacek and A. Gölzhäuser Springer 2017.Google Scholar
[3] Wirtz, T., Philipp, P., Audinot, J.-N., Dowsett, D. Eswara, S. Nanotechnology 26 2015 434001.Google Scholar
[4] Bundesanstalt für Materialforschung und -prüfung (BAM) https://rrr.bam.de/RRR/Content/EN/Downloads/RM-certificates/RM-cert-layer-and-surface/bam_l200.html.Google Scholar