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Nanobeam Diffraction and Geometric Phase Analysis for Strain Measurements in Si/SiGe Nanosheet Structures

Published online by Cambridge University Press:  25 July 2016

J. Li ,
S. Reboh ,
Robin Chao ,
N. Loubet ,
M. Guillorn ,
T. Yamashita  and
J. Gaudiello
J. Li
Affiliation:
IBM, Albany, NY
S. Reboh
Affiliation:
CEA LETI, Albany, NY
Robin Chao
Affiliation:
IBM, Albany, NY
N. Loubet
Affiliation:
IBM, Albany, NY
M. Guillorn
Affiliation:
IBM, Albany, NY
T. Yamashita
Affiliation:
IBM, Albany, NY
J. Gaudiello
Affiliation:
IBM, Albany, NY

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 22 , Supplement S3: Proceedings of Microscopy & Microanalysis 2016 , July 2016 , pp. 1528 - 1529
Copyright
© Microscopy Society of America 2016 

References

References:

[1] Ghani, T., etal., IEDM (p. 1161 (2003).Google Scholar
[2] This work was performed by the Research Alliance teams at various IBM Research and Development Facilities.Google Scholar