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Microstructural Analysis of Si Frameworks Induced by Electrochemical (De)Alloying Process

Published online by Cambridge University Press:  01 August 2018

Dong-Su Ko ,
Ken Ogata ,
Sungho Jeon ,
Changhoon Jung ,
Junho Lee ,
Soohwan Sul ,
Hee-Goo Kim  and
Jai Kwang Shin
Dong-Su Ko
Affiliation:
Platform Technology Lab, Samsung Advanced Institute of Technology, Suwon, Republic of Korea
Ken Ogata
Affiliation:
Samsung Research Institute of Japan, Mino, Japan
Sungho Jeon
Affiliation:
Energy Lab, Samsung Advanced Institute of Technology, Suwon, Republic of Korea
Changhoon Jung
Affiliation:
Platform Technology Lab, Samsung Advanced Institute of Technology, Suwon, Republic of Korea
Junho Lee
Affiliation:
Platform Technology Lab, Samsung Advanced Institute of Technology, Suwon, Republic of Korea
Soohwan Sul
Affiliation:
Platform Technology Lab, Samsung Advanced Institute of Technology, Suwon, Republic of Korea
Hee-Goo Kim
Affiliation:
Platform Technology Lab, Samsung Advanced Institute of Technology, Suwon, Republic of Korea
Jai Kwang Shin
Affiliation:
Platform Technology Lab, Samsung Advanced Institute of Technology, Suwon, Republic of Korea

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 24 , Supplement S1: Proceedings of Microscopy & Microanalysis 2018 , August 2018 , pp. 1712 - 1713
Copyright
© Microscopy Society of America 2018 

References

[1] Erlebacher, J., Aziz, M. J., Karma, A, Dimitrov, N. Sieradzki, K. Nature 410 2001 450–453.Google Scholar
[2] Ogata, K., Jeon, S., Ko, D.-S., et al Nature Communication accepted (2018).Google Scholar
[3] Wang, H., Wang, X., Xia, S. Chew, H. B. The Journal of Chemical Physics 143 2015 104703.Google Scholar