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Microhotplate Chemical Vapor Deposition and in the Environmental SEM Chamber

Published online by Cambridge University Press:  02 July 2020

S. A. Wight ,
R. E. Cavicchi ,
M. J. Nystrom  and
F. DiMeo
S. A. Wight
Affiliation:
Surface and Microanalysis Science Division, National Institute of Standards and Technology, Gaithersburg, MD20899
R. E. Cavicchi
Affiliation:
Process Measurements Division, National Institute of Standards and Technology, Gaithersburg, MD20899
M. J. Nystrom
Affiliation:
Process Measurements Division, National Institute of Standards and Technology, Gaithersburg, MD20899
F. DiMeo
Affiliation:
Process Measurements Division, National Institute of Standards and Technology, Gaithersburg, MD20899
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Extract

Metal oxide films are are an emerging sensing technology for the identification of gas phase species. Metalorganic chemical vapor deposition (MOCVD) on microhotplate structures provides a method of fabricating gas sensing layers in self-patterned structures. Investigation of the morphological characteristics of film growth is normally not possible inside a MOCVD reactor, especially the nucleation phase and subsequent deposition of a continuous film. The environmental scanning electron microscope (ESEM) operates at a pressure range of 133-666 Pa (1-5 Torr) which is similar to the growth condition normally used for oxide film MOCVD on microhotplates. Our results show that microhotplate MOCVD can be monitored in situby secondary electron and backscattered electron imaging in the ESEM.

The microhotplate chemical sensor devices employed in this work are mounted in conventional 40 pin packages which provide separate electrical connections to each of the four micromachined heater and contact structures.

Type
In Situ Studies in Microscopy
Information
Microscopy and Microanalysis , Volume 3 , Issue S2: Proceedings: Microscopy & Microanalysis '97, Microscopy Society of America 55th Annual Meeting, Microbeam Analysis Society 31st Annual Meeting, Histochemical Society 48th Annual Meeting, Cleveland, Ohio, August 10-14, 1997 , August 1997 , pp. 603 - 604
Copyright
Copyright © Microscopy Society of America 1997

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References

Cavicchi, R. E.et al., Appl. Phys. Lett. 66 (1995) 812.10.1063/1.113429CrossRefGoogle Scholar
Certain commercial equipment, instruments, or materials are identified in this report to specify adequately the experimental procedure. Such identification does not imply recommendation orendorsement by the National Institute of Standards and Technology, nor does it imply that the materials or equipment identified are necessarily the best available for the purpose.Google Scholar