Hostname: page-component-586b7cd67f-gb8f7 Total loading time: 0 Render date: 2024-11-28T15:40:11.799Z Has data issue: false hasContentIssue false

Local Halide Distributions in High-Speed Tabular Ag(Br,I) Emulsion Microcrystals by Cryo-FEG-AEM

Published online by Cambridge University Press:  02 July 2020

V. Oleshko
Affiliation:
Polaroid Corporation, Waltham, MA , 02451-1718
P. Crozier
Affiliation:
Center for Solid State Science, Arizona State University, Tempe, AZ , 85287-1704
L. Garone
Affiliation:
Polaroid Corporation, Waltham, MA , 02451-1718
J. Freedman
Affiliation:
Polaroid Corporation, Waltham, MA , 02451-1718
Get access

Abstract

The unique physical and chemical properties of AgX (X=C1, Br, I) emulsion microcrystals (optical, solid state, transport, chemical and spectral sensitizations and development) account for their use as basic light quanta detectors in practical photography for over 150 years. in spite of the advances made in other recording systems, especially in electronic imaging, contemporary AgX-based photographic materials are still superior in sensitivity and resolution. Although the replacement of AgX-based imaging systems by electronic imaging was already predicted 20 years ago, their current world manufacturing level is now larger than ever. However, in order to be successfully incorporated into digital and hybrid information technologies for the new Millennium, AgX-based photographic materials should further improve their quantum efficiency and image quality. in order to achieve these objectives, the key components should be intentionally modified with a focus primarily at the nanostructural level.

Type
Microscopy in the Real World: Semiconductors and Materials
Copyright
Copyright © Microscopy Society of America 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1.Oleshko, V. P. et al., Micron, 31 (2000), 55.CrossRefGoogle Scholar
2.Oleshko, V. P., Microsc. Res. Teen., 42 (1998) 82.3.0.CO;2-P>CrossRefGoogle Scholar
3.Oleshko, V. P. et al., Microsc. Res. Teen., 42 (1998) 108.3.0.CO;2-P>CrossRefGoogle Scholar