Hostname: page-component-586b7cd67f-rdxmf Total loading time: 0 Render date: 2024-11-24T19:22:48.688Z Has data issue: false hasContentIssue false
  • English
  • Français

Is It Feasible To Routinely Check The Dopant Profiling Via Off-Axis Electron Holography For An IC Failure Analysis Laboratory?

Published online by Cambridge University Press:  21 July 2003

K.W. Lee ,
H.J. Park ,
Y.C. Wang ,
B.K. Park ,
Sean Da ,
Y.N. Kim ,
J.S. Kim ,
E. Van Cappellen  and
S.M. Chon
K.W. Lee
Affiliation:
Samsung Electronics Co, Hwasung-City, Gyeonggi-Do, Korea 449-711
H.J. Park
Affiliation:
Samsung Electronics Co, Hwasung-City, Gyeonggi-Do, Korea 449-711
Y.C. Wang
Affiliation:
FEI Company, Hillsboro, OR 97124
B.K. Park
Affiliation:
Samsung Electronics Co, Hwasung-City, Gyeonggi-Do, Korea 449-711
Sean Da
Affiliation:
FEI Company, Hillsboro, OR 97124
Y.N. Kim
Affiliation:
Samsung Electronics Co, Hwasung-City, Gyeonggi-Do, Korea 449-711
J.S. Kim
Affiliation:
Samsung Electronics Co, Hwasung-City, Gyeonggi-Do, Korea 449-711
E. Van Cappellen
Affiliation:
FEI Company, Hillsboro, OR 97124
S.M. Chon
Affiliation:
Samsung Electronics Co, Hwasung-City, Gyeonggi-Do, Korea 449-711

Abstract

An abstract is not available for this content so a preview has been provided. As you have access to this content, a full PDF is available via the ‘Save PDF’ action button.
Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Abstract
Information
Microscopy and Microanalysis , Volume 9 , Issue S02 , August 2003 , pp. 774 - 775
Copyright
Copyright © Microscopy Society of America 2003