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Investigation of Metal-Assisted Chemical Etching for Fabrication of Silicon-Based X-Ray Zone Plates

Published online by Cambridge University Press:  10 August 2018

Rabia Akan
Affiliation:
KTH Royal Institute of Technology, Department of Applied Physics, Biomedical and X-ray Physics, Stockholm, Sweden
Karolis Parfeniukas
Affiliation:
KTH Royal Institute of Technology, Department of Applied Physics, Biomedical and X-ray Physics, Stockholm, Sweden
Carmen Vogt
Affiliation:
KTH Royal Institute of Technology, Department of Applied Physics, Biomedical and X-ray Physics, Stockholm, Sweden
Muhammet S. Toprak
Affiliation:
KTH Royal Institute of Technology, Department of Applied Physics, Biomedical and X-ray Physics, Stockholm, Sweden
Ulrich Vogt*
Affiliation:
KTH Royal Institute of Technology, Department of Applied Physics, Biomedical and X-ray Physics, Stockholm, Sweden
*
* Corresponding author, [email protected]

Abstract

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Type
Abstract
Copyright
© Microscopy Society of America 2018 

References

[1] Huang, Z., et al, Adv. Mater. 23 2011 285308.CrossRefGoogle Scholar
[2] Chang, C. Sakdinawat, A. Nat. Commun. 5 2014 17.Google Scholar
[3] Li, K., et al, J. Vac. Sci. Technol. B 35 2017 06G901.CrossRefGoogle Scholar
[4] Parfeniukas, K., et al, Proc. SPIE 10386 2017 103860S.Google Scholar
[5] Akan, R., et al, RSC Adv. Accepted Manuscript 2018.Google Scholar