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Integration of a Monochromator in the Field Emission STEM

Published online by Cambridge University Press:  02 July 2020

H.W. Mookb  and
P.E. Batsona
H.W. Mookb
Affiliation:
IBM Thomas J. Watson Research Center. Yorktown Heights., New York10598
P.E. Batsona
Affiliation:
Delft University of Technology., Delft, the Netherlands
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It would be very desirable to obtain EELS at 0. l-0.2eV resolution for bandstructure studies at interfaces and defects. [1,2] It has been possible to build spectrometers that perform in this energy range, but it has been difficult to utilize this resolution, because the energy width of the cold field emission source is about 0.3-0.4 eV for the currents needed to do practical microscopy. [3] Numerical methods have been used to sharpen the spectra, showing unambiguously that EELS spectra would benefit greatly if a higher resolution source were available. [4,5]

This situation has led one of us (H.W. Mook) to investigate electron monochromator optical designs which would be compatible with the high brightness and current required by the STEM. [6] This work produced a 4cm long monochromator that can be integrated into the field emission source. As shown in Fig. 1, the monochromator optics includes a field lens formed by deceleration of the electron beam from the 3 KeV extraction energy to about 350 eV inside the monochromator, a short Wien Filter velocity dispersive field, 150nm wide Si energy selecting slits, and an acceleration field lens at the monochromator exit.

Type
Compositional Imaging and Spectroscopy
Information
Microscopy and Microanalysis , Volume 5 , Issue S2: Proceedings: Microscopy & Microanalysis '99, Microscopy Society of America 57th Annual Meeting, Microbeam Analysis Society 33rd Annual Meeting, Portland, Oregon August 1-5, 1999 , August 1999 , pp. 648 - 649
Copyright
Copyright © Microscopy Society of America

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References

1.Batson, P.E J., Electron Microsc. 45 (1996) 51.CrossRefGoogle Scholar
2.Bangert, U., et al. Ultramicroscopy, 68 (1997) 173.CrossRefGoogle Scholar
3.Batson, P.E., Rev. Sci. Inst., 57 (1986)43.CrossRefGoogle Scholar
4.Batson, P.E., et al., Ultramicroscopy, 41 (1992) 137.CrossRefGoogle Scholar
5.Overwijk, M.H.F. et al. Proc. XIV1CEM. V. I (1998) 531.Google Scholar
6.Mook, H.W, and Kruit, P, Nucl. Inst, and Meth. in Phys. Res. A, to be publishedGoogle Scholar