Hostname: page-component-78c5997874-lj6df Total loading time: 0 Render date: 2024-11-02T20:57:45.217Z Has data issue: false hasContentIssue false
  • English
  • Français

In-Situ Transmission Elecron Microscopy (TEM) Study of the Nitridation of Basal Plane Sapphire by Reactive Molecular Beam Epitaxy (RMBE)

Published online by Cambridge University Press:  02 July 2020

M. Yeadon ,
M.T. Marshall  and
J.M. Gibson
M. Yeadon
Affiliation:
Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL61801
M.T. Marshall
Affiliation:
Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL61801
J.M. Gibson
Affiliation:
Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL61801
Get access

Extract

Group III-nitride thin films are currently of great interest for use in wide-bandgap semiconductor applications including UV lasers and light emitting diodes (LEDs). Sapphire (a-Al2O3) is currently the substrate of choice for the growth of GaN despite a large lattice mismatch. Growth of high quality GaN epilayers typically involves the deposition of a buffer layer of either AIN or GaN at a temperature well below that used for the growth of the active GaN layer. It has been found empirically that nitridation of the sapphire surface with nascent nitrogen prior to growth of the buffer layer results in a substantial improvement in film quality. Using a novel ultra-high vacuum (UHV) in-situ TEM with in-situ RMBE, we have studied the nitridation of the (0001) sapphire surface using transmission and reflection electron microscopy (REM), reflection high energy electron diffraction (RHEED) and Auger electron spectroscopy (AES).

An electron-transparent sapphire TEM sample was annealed at 1400°C for 12 hours in flowing oxygen, to form atomically flat surfaces for our investigation.

Type
Recent Developments in Microscopy for Studying Electronic and Magnetic Materials
Information
Microscopy and Microanalysis , Volume 3 , Issue S2: Proceedings: Microscopy & Microanalysis '97, Microscopy Society of America 55th Annual Meeting, Microbeam Analysis Society 31st Annual Meeting, Histochemical Society 48th Annual Meeting, Cleveland, Ohio, August 10-14, 1997 , August 1997 , pp. 475 - 476
Copyright
Copyright © Microscopy Society of America 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1.Morkoc, H., Strite, S., Gao, G.B., Lin, M.E., Sverdlov, B. and Burns, M., J. Appl. Phys. 76 (1994)1363.10.1063/1.358463CrossRefGoogle Scholar
2.Akasaki, I., Amano, H., Koide, Y., Hiramatsu, K.and Sawaki, N., J. Cryst. Growth 98 (1989) 209.10.1016/0022-0248(89)90200-5CrossRefGoogle Scholar
3.Marshall, M.T. and Gibson, J.M., Rev. Sci. Instr. submitted.Google Scholar
4. The authors gratefully acknowledge the use of facilities in the Center for Microanalysis ofMaterials at UIUC, and the Office of Naval Research for financial support under contract N00014- 95-1-0324.Google Scholar