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In Situ Electron Holography of Ferroelectric Thin Films

Published online by Cambridge University Press:  23 September 2015

Myung-Geun Han ,
Matthew S. J. Marshall ,
Lijun Wu ,
Frederick J. Walker ,
Charles H. Ahn  and
Yimei Zhu
Myung-Geun Han
Affiliation:
Condensed Matter Physics & Materials Science, Brookhaven National Laboratory, Upton, NY, USA
Matthew S. J. Marshall
Affiliation:
Department of Applied Physics and Center for Research on Interface Structures and Phenomena, Yale University, New Haven, CT, USA
Lijun Wu
Affiliation:
Condensed Matter Physics & Materials Science, Brookhaven National Laboratory, Upton, NY, USA
Frederick J. Walker
Affiliation:
■
Charles H. Ahn
Affiliation:
■
Yimei Zhu
Affiliation:
Condensed Matter Physics & Materials Science, Brookhaven National Laboratory, Upton, NY, USA

Abstract

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Abstract
Information
Microscopy and Microanalysis , Volume 21 , Supplement S3: Proceedings of Microscopy & Microanalysis 2015 , August 2015 , pp. 1401 - 1402
Copyright
Copyright © Microscopy Society of America 2015 

References

[1] Setter, N., et al, Journal of Applied Physics 100 (2006).Google Scholar
[2] Catalan, G., et al, Review of Modern Physics, 84 (2012).Google Scholar
[3] Han, M.-G., et al, Nature Communications 5 (2014).Google Scholar
[4] Blank, H., et al, Applied Physics Letters 2, 140 (1963).Google Scholar
[5] The authors acknowledge funding from Division of Materials Science and Engineering, Office of Basic Energy Science, the U.S. Department of Energy, under Contract number DE-AC02-98CH10886 and NSF, MRSEC under DMR11926 (CRISP) and DMR 1309868. Dr. Toshihiro Aoki and Dr. Ray Twesten are acknowledged for their useful discussion and helps on electron microscopy.Google Scholar