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Impurity Segregation via Extended Defects in Oxide Thin Films Probed by Aberration-Corrected STEM-EELS

Published online by Cambridge University Press:  25 July 2016

David J. Baek
Affiliation:
School of Electrical and Computer Engineering, Cornell University, Ithaca, NY, USA
Di Lu
Affiliation:
Department of Physics, Stanford University, Stanford, CA, USA
Yasuyuki Hikita
Affiliation:
Stanford Institute for Materials and Energy Sciences, SLAC National Accelerator Laboratory, Menlo P,ark, CA, USA
Harold Y. Hwang
Affiliation:
Stanford Institute for Materials and Energy Sciences, SLAC National Accelerator Laboratory, Menlo P,ark, CA, USA Department of Applied Physics, Stanford University, Stanford, CA, USA
Lena F. Kourkoutis
Affiliation:
School of Applied and Engineering Physics, Cornell University, Ithaca, NY, USA Kavli Institute at Cornell for Nanoscale Science, Cornell University, Ithaca, NY, USA

Abstract

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Type
Abstract
Copyright
© Microscopy Society of America 2016 

References

[1] Lu, D, et al, MRS (Spring (2014) K12, 11.Google Scholar
[2] Chang, C. -P, et al, Nat. Commun 5 (2014). p. 1.Google Scholar
[3] Arredondo, M, et al, Adv. Mater 22 (2010). p. 2430.Google Scholar
[4] This work was supported by the Cornell Center for Materials Research with funding from the NSF MRSEC program (DMR-1120296) and the Department of Energy, Office of Basic Energy Sciences, Division of Materials Sciences and Engineering, under contract DE-AC02-76SF00515.Google Scholar