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The Hitachi HD-2000 in Semicondutor Manufacturing Support and Research.

Published online by Cambridge University Press:  02 July 2020

R.R. Vanfleet  and
C.B. Vartuli
R.R. Vanfleet
Affiliation:
Advanced Materials Processing and Analysis Center (AMPAC) and Department of Physics, University of Central Florida, Orlando, FL32816
C.B. Vartuli
Affiliation:
Lucent Technologies, 9333 S. John Young Pkwy, Orlando, FL32819
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Extract

A Hitachi HD-2000 dedicated STEM with a cold field emission source was installed last fall at the Lucent Technologies Semiconductor Fab site in Orlando. The close relationship between the Orlando arm of Lucent Technologies and the University of Central Florida has and will allow this instrument to be evaluated for its usefulness in two roles: Support of the development and fabrication needs of a semiconductor fabrication facility and the research needs of University based Materials research.

This Hitachi instrument was specifically designed to meet the needs of the semiconductor industry. Sample holder compatibility with the Hitachi Focused Ion Beam (FIB) allows rapid swapping between the two tools. A large solid angle Energy Disperse X-ray Spectrometer (EDS) supports increased resolution and sensitivity of X-ray analysis. Direct digital acquisition speeds image and data transfer to the end user. All these and other features speed the turn around time and usefulness for manufacturing line feedback.

Type
The Theory and Practice of Scanning Transmission Electron Microscopy
Information
Microscopy and Microanalysis , Volume 6 , Issue S2: Proceedings: Microscopy & Microanalysis 2000, Microscopy Society of America 58th Annual Meeting, Microbeam Analysis Society 34th Annual Meeting, Microscopical Society of Canada/Societe de Microscopie de Canada 27th Annual Meeting, Philadelphia, Pennsylvania August 13-17, 2000 , August 2000 , pp. 116 - 117
Copyright
Copyright © Microscopy Society of America

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