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High-Temperature Growth of Mn5Ge3Cx Thin Films on Ge (001) Substrates: Reactive Deposition Epitaxy vs. Solid Deposition Epitaxy

Published online by Cambridge University Press:  22 July 2022

A. Alvídrez-Lechuga*
Affiliation:
Centro de Investigación en Materiales Avanzados, S.C. (CIMAV), Miguel de Cervantes 120, 31136, Chihuahua, Chih. México
J. T. Holguín-Momaca
Affiliation:
Centro de Investigación en Materiales Avanzados, S.C. (CIMAV), Miguel de Cervantes 120, 31136, Chihuahua, Chih. México
C. R. Santillán-Rodríguez
Affiliation:
Centro de Investigación en Materiales Avanzados, S.C. (CIMAV), Miguel de Cervantes 120, 31136, Chihuahua, Chih. México
S. F. Olive-Méndez
Affiliation:
Centro de Investigación en Materiales Avanzados, S.C. (CIMAV), Miguel de Cervantes 120, 31136, Chihuahua, Chih. México
*
*Corresponding author: [email protected]

Abstract

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Type
General Physical Sciences
Copyright
Copyright © Microscopy Society of America 2022

References

Gajdzik, M., et al. , J. Magn. Magn. Mater. 221 (2000), 248-254. doi:10.1016/S0304-8853(00)00494-7CrossRefGoogle Scholar
Alvídrez-Lechuga, A., et al. , J. Alloys Compd. 762 (2018), 363-369. doi:10.1016/j.jallcom.2018.05.209CrossRefGoogle Scholar
Alvídrez-Lechuga, A. et al. , Superficies y Vacío 30 (2017), 61-64.10.47566/2017_syv30_1-040061CrossRefGoogle Scholar
The authors thank the financial support obtained from Ciencia-Básica SEP-CONACYT grant No. 157559 and Fondo Mixto Chihuahua FOMIX grant No. CHIH-2011-C03-1688.Google Scholar