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Generating Large Magnetic Field in a High Resolution Electron Beam Lithography

Published online by Cambridge University Press:  23 September 2015

C.H. Wan ,
P. Guo ,
Q. T. Zhang ,
A. Rudzinski ,
T. Kliem ,
R. Jede ,
X. Y. Sun  and
X.F. Han
C.H. Wan
Affiliation:
Institute of Physics, Chinese Academy of Sciences, Beijing National Laboratory of Condensed Matter Physics, Beijing, 100190, Peoples Republic of China
P. Guo
Affiliation:
Institute of Physics, Chinese Academy of Sciences, Beijing National Laboratory of Condensed Matter Physics, Beijing, 100190, Peoples Republic of China
Q. T. Zhang
Affiliation:
Institute of Physics, Chinese Academy of Sciences, Beijing National Laboratory of Condensed Matter Physics, Beijing, 100190, Peoples Republic of China
A. Rudzinski
Affiliation:
Raith GmbH, Dortmund, D-44263, Germany
T. Kliem
Affiliation:
Raith GmbH, Dortmund, D-44263, Germany
R. Jede
Affiliation:
Raith GmbH, Dortmund, D-44263, Germany
X. Y. Sun
Affiliation:
GermanTech Co, Ltd, Beijing, 100190, Peoples Republic of China
X.F. Han
Affiliation:
Institute of Physics, Chinese Academy of Sciences, Beijing National Laboratory of Condensed Matter Physics, Beijing, 100190, Peoples Republic of China

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 21 , Supplement S3: Proceedings of Microscopy & Microanalysis 2015 , August 2015 , pp. 1049 - 1050
Copyright
Copyright © Microscopy Society of America 2015 

References

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[4] Huai, Y., AAPPS Bulletin 18 (2008) 33.Google Scholar