Gas Assisted E-beam Lithography Using the JSM-7600F Ultra-High Resolution Schottky FEG-SEM and OmniGIS

N Erdman; A Laudate; C Hartfield

doi:10.1017/S1431927610059581

Gas Assisted E-beam Lithography Using the JSM-7600F Ultra-High Resolution Schottky FEG-SEM and OmniGIS

Published online by Cambridge University Press: 01 August 2010

N Erdman ,

A Laudate and

C Hartfield

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N Erdman: Affiliation:
JEOL USA
A Laudate: Affiliation:
JEOL USA
C Hartfield: Affiliation:
Omniprobe

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Extended abstract of a paper presented at Microscopy and Microanalysis 2010 in Portland, Oregon, USA, August 1 – August 5, 2010.

Type: Abstract
Information: Microscopy and Microanalysis , Volume 16 , Supplement S2 , July 2010 , pp. 58 - 59

DOI: https://doi.org/10.1017/S1431927610059581 [Opens in a new window]

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Gas Assisted E-beam Lithography Using the JSM-7600F Ultra-High Resolution Schottky FEG-SEM and OmniGIS

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