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Future Direction of High-Resolution X-Ray Microanalysis in the AEM

Published online by Cambridge University Press:  02 July 2020

M. Watanabe
Affiliation:
Res. Lab. High Voltage Electron Microscopy, Kyushu University, Fukuoka, 812-8581, Japan
D.B. Williams
Affiliation:
Dept. Materials Science and Engineering, Lehigh University, Bethlehem, PA18015, USA
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Abstract

Current commercial analytical electron microscopes (AEMs) including scanning transmission electron microscopes (STEMs) are a compromise design between the highest spatial, analytical and energy resolutions. in contrast, a VG HB603 STEM at Lehigh University has been designed with a 300 kV cold field-emission gun and twin X-ray detectors to maximize X-ray generation and collection efficiencies [1]. in addition, instrumental features of almost no stray radiation, ultra-high vacuum (<10−7 Pa in the stage and <10−7 Pa in the gun), beam blanking and direct probe-current measurement in the HB 603 have transformed the approaches to quantitative analysis. By using such modern AEMs, it is now possible to perform X-ray microanalysis with the spatial resolution as low as 1.5 nm and the detectability limits of∽2 atoms in the analyzed volume [2]. Furthermore, even quantitative X-ray mapping becomes achievable, while maintaining, high spatial resolution (the original aim of such instruments) [3].

Type
Quantitative STEM: Imaging and EELS Analysis Honoring the Contributions of John Silcox (Organized by P. Batson, C. Chen and D. Muller)
Copyright
Copyright © Microscopy Society of America 2001

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References

references

1.Lyman, C.E.et al., J. Microsc. 176 (1994) 85.CrossRefGoogle Scholar
2.Watanabe, M. and Williams, D.B.Ultramicroscopy 78 (1999) 89.CrossRefGoogle Scholar
3.Williams, D.B.et al., Microchimica Acta Suppl., 15(1998)49.Google Scholar
4.Cliff, G. and Lorimer, G. W., J. Microsc, 103(1975)203.CrossRefGoogle Scholar
5.Watanabe, M. and Williams, D.B.Microsc. Microanal., 5(1999): (suppl. 2), pp.8889.CrossRefGoogle Scholar
6.Egerton, R.F. and Cheng, S.C.Ultramicroscopy 55 (1994) 43.CrossRefGoogle Scholar
7.Lupini, A.R. and Krivanek, O.L Electron Microscopy -1998, Cancun (1998) 59.Google Scholar
8.Wollman, D.A.et al., J. Microsc. 188 (1997) 196.CrossRefGoogle Scholar
9.Lyman, C.E. Physical Aspects of Microscopic Characterization of Materials Suppl.l AMF O’Hare (1987) 123.Google Scholar
10.Newbury, D.E.et al., Ultramicroscopy 78 (1999)73CrossRefGoogle Scholar
11.Work supported through NSF DMR 9972670Google Scholar