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Full information acquisition and analysis of reflection high energy electron diffraction data for epitaxial growth processes

Published online by Cambridge University Press:  25 July 2016

R. K. Vasudevan
Affiliation:
Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge TN 37831USA Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge TN 37831USA
A. G. Gianfrancesco
Affiliation:
Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge TN 37831USA Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge TN 37831USA
A. P. Baddorf
Affiliation:
Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge TN 37831USA Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge TN 37831USA
S. V. Kalinin
Affiliation:
Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge TN 37831USA Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge TN 37831USA

Abstract

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Type
Abstract
Copyright
© Microscopy Society of America 2016 

References

References:

[1] Vasudevan, RK, Tselev, A, Baddorf, AP & Kalinin, SV ACS Nano 26 (2015). p. 10899.Google Scholar
[2] Marshall, MSJ & Castell, MR Chemical Society Reviews 43 (2014). p. 2226.Google Scholar
[3] Tselev, A, Vasudevan, RK, Gianfrancesco, AG, Liang, Q, Ganesh, P, Meyer, TL, Lee, HN, Biegalski, MD, Baddorf, AP & Kalinin, SV ACS Nano 9 (2015). p. 4316.Google Scholar
[4] This research was sponsored by the Division of Materials Sciences and Engineering, BES, DOE (RKV, SVK). Research was conducted at the Center for Nanophase Materials Sciences, which also provided support (APB) and is a DOE Office of Science User Facility.Google Scholar