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Field Evaporation Behavior of Metal Oxide/Metal Interfaces

Published online by Cambridge University Press:  25 July 2016

Mukesh Bachhav
Affiliation:
Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI, USA
Francois Vurpillot
Affiliation:
Groupe de Physique des Matériaux, Université et INSA de Rouen-UMR CNRS 6634-Normandie Université, 76801 St Etienne du Rouvray, France
Frederic Danoix
Affiliation:
Groupe de Physique des Matériaux, Université et INSA de Rouen-UMR CNRS 6634-Normandie Université, 76801 St Etienne du Rouvray, France
Raphaële Danoix
Affiliation:
Groupe de Physique des Matériaux, Université et INSA de Rouen-UMR CNRS 6634-Normandie Université, 76801 St Etienne du Rouvray, France
Beatrice Hannoyer
Affiliation:
Groupe de Physique des Matériaux, Université et INSA de Rouen-UMR CNRS 6634-Normandie Université, 76801 St Etienne du Rouvray, France
Emmanuelle A. Marquis
Affiliation:
Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI, USA

Abstract

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Type
Abstract
Copyright
© Microscopy Society of America 2016 

References

References:

[1] Oberdorfer, C. & Schmitz, G. Microscopy and Microanalysis 17 (2011) 15.Google Scholar
[2] Marquis, E., et al, Journal of microscopy 241 (2011) 225.Google Scholar
[3] Sawa, A Materials today 11 (2008) 28.Google Scholar
[4] This work was supported by the University of Michigan College of Engineering and the Michigan Center for Materials Characterization ..Google Scholar