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Fast mechanical shutter in Hitachi HF 3300, a 60 kV to 300 kV TEM

Published online by Cambridge University Press:  01 August 2010

M Malac ,
RA McLeod ,
P Li ,
WC Bigelow ,
JY Howe ,
LF Allard Jr ,
Y Taniguchi  and
MS Moreno
M Malac
Affiliation:
National Institute for Nanotechnology, Canada
RA McLeod
Affiliation:
National Institute for Nanotechnology, Canada
P Li
Affiliation:
National Institute for Nanotechnology, Canada
WC Bigelow
Affiliation:
University of Michigan
JY Howe
Affiliation:
Oak Ridge National Laboratory
LF Allard Jr
Affiliation:
Oak Ridge National Laboratory
Y Taniguchi
Affiliation:
Hitachi High Technologies Corporation, Japan
MS Moreno
Affiliation:
Centro Atomico Bariloche, Argentina

Extract

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Extended abstract of a paper presented at Microscopy and Microanalysis 2010 in Portland, Oregon, USA, August 1 – August 5, 2010.

Type
Abstract
Information
Microscopy and Microanalysis , Volume 16 , Supplement S2 , July 2010 , pp. 338 - 339
Copyright
Copyright © Microscopy Society of America 2010