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EXEELFS (Extended Electron Energy Loss Fine Structure) Study of Tin Grown by the DC Sputtering Technique.

Published online by Cambridge University Press:  02 July 2020

Duarte-Moller A.
Affiliation:
Centro de Investigación en Materiales Avanzados, S. C. Miguel de Cervantes 120, Complejo Industrial Chihuahua. Chihuahua, Chihuahua 31109, México.
F. Espinosa-Maganña
Affiliation:
Centro de Investigación en Materiales Avanzados, S. C. Miguel de Cervantes 120, Complejo Industrial Chihuahua. Chihuahua, Chihuahua 31109, México.
R. Martínez-S´anchez
Affiliation:
Centro de Ciencias de la Materia Condensada-UNAM. Km.107 Carretera Tijuana-Enscnada, Ensenada, B. C. 22800, México
O. Contreras
Affiliation:
Centro de Ciencias de la Materia Condensada-UNAM. Km.107 Carretera Tijuana-Enscnada, Ensenada, B. C. 22800, México
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Extract

Titanium nitride coatings were grown in a physical vapor deposition system assisted by a direct current reactive magnetron sputtering technique. The vacuum chamber was evacuated with a mechanical pump and cryopump to a base pressure of 10-7 Torr. The Sputtering was performed with a direct current high voltage source (0-1 Kev and 1 A) on a titanium target (99.98% purity). The titanium target was sputtered with a high purity argon -nitrogen mixture. The films were deposited on monocrystalline silicon (mc-Si) (111) substrates at different nitrogen partial pressures from 0.08 mTorr to 1.5 mTorr. Total pressure, power applied to target and substrate temperature were keep constant in all the experiments.

EXEELFS analysis were done using the standard procedure [1,2]. In this case, we are find that the atomic concentration is in good agreement with the respective established stoichioinetry N/T=0.99. Figure 1 shows the window of high energy loss where appears their respective N K-edge and Ti -L23.

Type
Electron Energy-Loss Spectroscopy (EELS) and Imaging
Copyright
Copyright © Microscopy Society of America

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References

1.De Crescenzi, M., Surf. Sci. Reports, 21 (1995)Google Scholar
2.Duarte-Moller, A., et al. Appl. Surf. Sci. 108(1996)5963CrossRefGoogle Scholar