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Embracing Uncertainty: Modeling the Standard Uncertainty in Electron Probe Microanalysis—Part I

Published online by Cambridge University Press:  21 May 2020

Nicholas W. M. Ritchie
Nicholas W. M. Ritchie*
Affiliation:
Microanalysis Group, Materials Measurement Science Division, National Institute of Standards and Technology, Gaithersburg, MD20899-8371, USA
*
*Author for correspondence: Nicholas W. M. Ritchie, E-mail: [email protected]
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Abstract

This is the first in a series of articles which present a new framework for computing the standard uncertainty in electron excited X-ray microanalysis measurements. This article will discuss the framework and apply it to a handful of simple, but useful, subcomponents of the larger problem. Subsequent articles will handle more complex aspects of the measurement model. The result will be a framework in which sophisticated and practical models of the uncertainty for real-world measurements. It will include many long overlooked contributions like surface roughness and coating thickness. The result provides more than just error bars for our measurements. It also provides a framework for measurement optimization and, ultimately, the development of an expert system to guide both the novice and expert to design more effective measurement protocols.

Keywords

compositionelectron probe microanalysisk-ratiouncertainty
Type
Software and Instrumentation
Information
Microscopy and Microanalysis , Volume 26 , Issue 3 , June 2020 , pp. 469 - 483
Copyright
Copyright © Microscopy Society of America 2020

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