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Electron Energy-Loss Spectroscopy (EELS) Study of NbOx Film for Resistive Memory Applications

Published online by Cambridge University Press:  23 September 2015

Jiaming Zhang ,
Kate Norris ,
Katy Samuels ,
Ning Ge ,
Max Zhang ,
Joonsuk Park ,
Robert Sinclair ,
Gary Gibson ,
J. Joshua Yang  and
Zhiyong Li
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Jiaming Zhang
Affiliation:
Hewlett Packard Labs, 1501 Page Mill Rd, Palo Alto, CA 94304 USA
Kate Norris
Affiliation:
Hewlett Packard Labs, 1501 Page Mill Rd, Palo Alto, CA 94304 USA
Katy Samuels
Affiliation:
Hewlett Packard Labs, 1501 Page Mill Rd, Palo Alto, CA 94304 USA
Ning Ge
Affiliation:
Hewlett Packard Labs, 1501 Page Mill Rd, Palo Alto, CA 94304 USA
Max Zhang
Affiliation:
Hewlett Packard Labs, 1501 Page Mill Rd, Palo Alto, CA 94304 USA
Joonsuk Park
Affiliation:
Department of Materials Science and Engineering, Stanford University, Stanford, CA 94305 USA
Robert Sinclair
Affiliation:
Department of Materials Science and Engineering, Stanford University, Stanford, CA 94305 USA
Gary Gibson
Affiliation:
Hewlett Packard Labs, 1501 Page Mill Rd, Palo Alto, CA 94304 USA
J. Joshua Yang
Affiliation:
Hewlett Packard Labs, 1501 Page Mill Rd, Palo Alto, CA 94304 USA
Zhiyong Li
Affiliation:
Hewlett Packard Labs, 1501 Page Mill Rd, Palo Alto, CA 94304 USA
R. Stanley Williams
Affiliation:
Hewlett Packard Labs, 1501 Page Mill Rd, Palo Alto, CA 94304 USA

Abstract

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Abstract
Information
Microscopy and Microanalysis , Volume 21 , Supplement S3: Proceedings of Microscopy & Microanalysis 2015 , August 2015 , pp. 285 - 286
Copyright
Copyright © Microscopy Society of America 2015 

References

References:

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