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Effective Method for Decreasing Detection Limit of Dopant Concentration in Semiconductor Using Dual SDD Analysis System

Published online by Cambridge University Press:  25 July 2016

K. Fukunaga ,
N. Endo ,
M. Suzuki  and
Y. Kondo
K. Fukunaga
Affiliation:
JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo, JAPAN
N. Endo
Affiliation:
JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo, JAPAN
M. Suzuki
Affiliation:
Thermo Fischer Scientific Japan, 3-9 Moriya-cho, Kanagawa-ku, Yokohama, JAPAN
Y. Kondo
Affiliation:
JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo, JAPAN

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 22 , Supplement S3: Proceedings of Microscopy & Microanalysis 2016 , July 2016 , pp. 316 - 317
Copyright
© Microscopy Society of America 2016 

References

[1] Ziebold, TO. Anal. Chem 39(8 (1967). p. 858.Google Scholar
[2] Fukunaga, K., et al, Microscopy & Microanalysis 21(S3 (2015). p. 823.CrossRefGoogle Scholar
[3] Egerton, R.F. “Electron Energy-Loss Spectroscopy in the Electron Microscope”, 3rd edition, p. 197.Google Scholar