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Effect of Oxygen on Sputtered Tantalum Nitride Thin Films for Photoelectrochemical Water Splitting

Published online by Cambridge University Press:  01 August 2018

Sam Macartney ,
Richard Wuhrer  and
Leigh R. Sheppard
Sam Macartney
Affiliation:
School of Computing, Engineering and Mathematics, Western Sydney University, Penrith, Australia
Richard Wuhrer
Affiliation:
Advanced Materials Characterisation Facility, Office of the Deputy Vice-Chancellor & Vice-President (Research & Development), Western Sydney University, Penrith, Australia
Leigh R. Sheppard
Affiliation:
School of Computing, Engineering and Mathematics, Western Sydney University, Penrith, Australia

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 24 , Supplement S1: Proceedings of Microscopy & Microanalysis 2018 , August 2018 , pp. 1546 - 1547
Copyright
© Microscopy Society of America 2018 

References

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[5] Rudolph, M., et al The role of oxygen in magnetron-sputtered Ta3N5 thin films for the photoelectrolysis of water. Surface and Coatings Technology.Google Scholar