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The Effect of Atomic Mass on the Physical Spatial Resolution in EBSD

Published online by Cambridge University Press:  06 August 2013

Delphic Chen
Affiliation:
Department of Materials Science and Engineering, National Cheng Kung University, Tainan 70101, Taiwan
Jui-Chao Kuo*
Affiliation:
Department of Materials Science and Engineering, National Cheng Kung University, Tainan 70101, Taiwan
*
*Corresponding author. E-mail: [email protected]
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Abstract

In this study, bicrystals of silver (Ag) and aluminum (Al) were used to investigate the physical spatial resolution of the electron backscatter diffraction system combining a digital image correlation method. Furthermore, the effect of the accelerating voltage and probe current was investigated on the physical spatial resolution of the lateral and longitudinal resolutions for Ag and Al, respectively. The lateral and longitudinal resolutions show high dependency on the accelerating voltage for a low atomic mass material of Al, In addition, these are almost independent of the accelerating voltage for a high atomic mass material of Ag. Moreover, the probe current does not play any role on both the lateral and longitudinal resolutions. The best lateral resolutions for Al and Ag are 40.5 and 12.1 nm at 10 kV and 1 nA, respectively. The best longitudinal resolutions of 23.2 and 80 nm were obtained at 10 kV and 1 nA for Al and Ag, respectively.

Type
Research Article
Copyright
Copyright © Microscopy Society of America 2013 

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References

ASTM (1999). E1559-99: Standard Guide for Electrolytic Polishing of Metallographic Specimens, pp. 114. Philadelphia, PA: American Society for Testing and Materials.Google Scholar
Babin, S., Cabrini, S., Dhuey, S., Harteneck, B., Machin, M., Martynov, A. & Peroz, C. (2009). Fabrication of 20nm patterns for automatic measurement of electron beam size using BEAMETR technique. Microelectron Eng 86, 524528.10.1016/j.mee.2008.11.074Google Scholar
Deal, A., Hooghan, T. & Eades, A. (2008). Energy-filtered electron backscatter diffraction. Ultramicroscopy 108, 116125.10.1016/j.ultramic.2007.03.010Google Scholar
Dingley, D. (2004). Progressive steps in the development of electron backscatter diffraction and orientation imaging microscopy. J Microsc Oxford 213, 214224.10.1111/j.0022-2720.2004.01321.xGoogle Scholar
Drouin, D., Couture, R., Loyl, D., Tastet, X., Aimez, V. & Gauvin, R. (2007). CASINO V2.42—A fast and easy-to-use modeling tool for electron microscopy and microanalysis users. Scanning 29, 92101.Google Scholar
Humphreys, F.J. (2004). Characterisation of fine-scale microstructures by electron backscatter diffraction (EBSD). Scripta Mater 51(8), 771776.10.1016/j.scriptamat.2004.05.016Google Scholar
Humphreys, F.J., Huang, Y., Brough, I. & Harris, C. (1999). Electron backscatter diffraction of grain and subgrain structures—Resolution considerations. J Microsc-Oxford 195, 212216.10.1046/j.1365-2818.1999.00579.xGoogle Scholar
Isabell, T.C. & Dravid, V.P. (1997). Resolution and sensitivity of electron backscattered diffraction in a cold field emission gun SEM. Ultramicroscopy 67(1-4), 5968.10.1016/S0304-3991(97)00003-XGoogle Scholar
Lyles, R.L., Rothman, S.J. & Jager, W. (1978). A cyanide-free solution for electropolishing silver. Metallography 11, 361363.10.1016/0026-0800(78)90049-6Google Scholar
Ren, S.X., Kenik, E.A., Alexander, K.B. & Goyal, A. (1998). Exploring spatial resolution in electron back-scattered diffraction experiments via Monte Carlo simulation. Microsc Microanal 4(1), 1522.10.1017/S1431927698980011Google Scholar
Schwarzer, R.A., Field, D.P., Adams, B.L., Kumar, M. & Schwartz, A.J. (2009). Present state of electron backscatter diffraction and prospective developments. In Electron Backscatter Diffraction in Materials Science, Schwartz, A.J., Kumar, M., Adams, B.L. & Field, D.P. (Eds.), pp. 119. New York: Springer.Google Scholar
Steinmetz, D.R. & Zaefferer, S. (2010). Towards ultrahigh resolution EBSD by low accelerating voltage. Mater Sci Tech-Lond 26, 640645.10.1179/026708309X12506933873828Google Scholar
Zaefferer, S. (2007). On the formation mechanisms, spatial resolution and intensity of backscatter Kikuchi patterns. Ultramicroscopy 107(2-3), 254266.10.1016/j.ultramic.2006.08.007Google Scholar