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Dual Lens Electron Holography for High Spatial Resolution Junction and Strain Mapping of Semiconductor Devices

Published online by Cambridge University Press:  27 August 2014

J. Bruley
Affiliation:
IBM, Zip 40E, Hudson Valley Research Park, 2070 Route 52, Hopewell Jct., NY 12533, USA

Abstract

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Type
Abstract
Copyright
Copyright © Microscopy Society of America 2014 

References

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