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Development of a Field Emission VP-SEM and Some Initial Applications

Published online by Cambridge University Press:  02 July 2020

Masako Nishimura
Affiliation:
Hitachi Science Systems, Ltd., 882 Ichige, Hitachinaka, Ibaraki, 312-8504, Japan
Sukehiro Itoh
Affiliation:
Hitachi Science Systems, Ltd., 882 Ichige, Hitachinaka, Ibaraki, 312-8504, Japan
Steve Joens
Affiliation:
Hitachi Science Systems, Ltd., 882 Ichige, Hitachinaka, Ibaraki, 312-8504, Japan
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Abstract

The use of variable pressure SEMs (VP-SEMs) is increasing in various fields of science and industry, allowing microscopy in a variable pressure environment of 1 ∼ 270 Pa utilizing backscattered electrons for imaging. The VP-SEM allows microscopy of insulated samples without the need for sample preparation. Charging artifacts can be minimized as well. When the VP-SEM is operated with a cooling stage, which allows cooling of samples at −20° and above, vaporization of water from samples is reduced. This permits microscopy of wet samples at close to the natural state for extended periods of time.

Poor S/N ratio and deterioration of resolution, both of which are due to collisions among residual gas molecules and primary/backscattered electrons, have limited the performance of VP-SEMs. For resolving these limitations, we have completed the development of a new field emission VP-SEM which operates with a stable Schottky field emission source, a new environmental secondary electron detector (ESED), and a multi-stage differential pumping system. Fig. 1 shows a sectional view of the column with the differential pumping system. This design allows stable gun vacuum conditions with variable specimen chamber pressure 10 through 3,000 Pa, permitting a pressure difference from the gun by 1011 Pa without problems.

Type
Corporate Session (Organized by M. Kersker)
Copyright
Copyright © Microscopy Society of America 2001

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References

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