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Detection of Characteristic Signals from As-Doped (less than 1 at.%) Regions of Silicon by Transmission Electron Microscopy and Convergent-beam Electron Diffraction

Published online by Cambridge University Press:  01 August 2004

Masami Terauchi
Affiliation:
Tohoku University, Japan
Kenji Tsuda
Affiliation:
Tohoku University, Japan
Hajime Mitsuishi
Affiliation:
Tohoku University, Japan
Kazuo Kawamura
Affiliation:
Fujitsu Ltd., Japan
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Extract

Extended abstract of a paper presented at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, August 1–5, 2004.

Type
Research Article
Copyright
© 2004 Microscopy Society of America

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