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A Comparison of Xenon Plasma FIB Technology with Conventional Gallium LMIS FIB: Imaging, Milling, and Gas-Assisted Applications

Published online by Cambridge University Press:  08 April 2017

R Young ,
C Rue ,
S Randolph ,
C Chandler ,
G Franz ,
R Schampers ,
A Klumpp  and
L Kwakman
R Young
Affiliation:
FEI Company
C Rue
Affiliation:
FEI Company
S Randolph
Affiliation:
FEI Company
C Chandler
Affiliation:
FEI Company
G Franz
Affiliation:
FEI Company
R Schampers
Affiliation:
FEI Company
A Klumpp
Affiliation:
Fraunhofer EMFT, Germany
L Kwakman
Affiliation:
FEI Company, The Netherlands

Extract

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Extended abstract of a paper presented at Microscopy and Microanalysis 2011 in Nashville, Tennessee, USA, August 7–August 11, 2011.

Type
Abstract
Information
Microscopy and Microanalysis , Volume 17 , Supplement S2 , July 2011 , pp. 652 - 653
Copyright
Copyright © Microscopy Society of America 2011