Hostname: page-component-78c5997874-4rdpn Total loading time: 0 Render date: 2024-11-02T23:16:52.315Z Has data issue: false hasContentIssue false
  • English
  • Français

Chemistry and Bonding at {222}Mgo/Cu Heterophase Interfaces

Published online by Cambridge University Press:  02 July 2020

D. A. Müller ,
D. A. Shashkov ,
R. Benedek ,
L. H. Yang ,
D. N. Seidman  and
J. Silcox
D. A. Müller
Affiliation:
School of Applied and Engineering Physics, Cornell University, Ithaca, NY14853
D. A. Shashkov
Affiliation:
Department of Materials Science & Engineering, Northwestern University, Evanston, IL60208
R. Benedek
Affiliation:
Department of Materials Science & Engineering, Northwestern University, Evanston, IL60208
L. H. Yang
Affiliation:
Condensed Matter Physics Division, Lawrence Livermore National Laboratory, Livermore, CA, 94551
D. N. Seidman
Affiliation:
Department of Materials Science & Engineering, Northwestern University, Evanston, IL60208
J. Silcox
Affiliation:
School of Applied and Engineering Physics, Cornell University, Ithaca, NY14853
Get access

Extract

Adhesion at ceramic/metal (C/M) interfaces often controls the macroscopic behavior of materials containing metallic and ceramic phases, and experimental studies of bonding at C/M interfaces have recently been reported. Electron energy loss spectroscopy (EELS) offers unique opportunities to examine bonding at interfaces on an atomic scale. The EELS near edge fine structure is sensitive to local atomic arrangements and thus can be used as a coordination fingerprint. Much more can be done, however, by analyzing the connection between the EELS fine structure, the underlying local electronic structure and the cohesive energy of an interface to gain a deeper understanding of the nature of the adhesion at the interface.

In this work, we apply high spatial-resolution EELS instrument to study {222} MgO/Cu interfaces produced by internal oxidation. We determine interfacial chemistry of this interface with subnanometer resolution (Fig. 1) and use EELS to directly measure the electronic states pertaining to the interface

Type
Atomic Structure and Mechanisms at Interfaces in Materials
Information
Microscopy and Microanalysis , Volume 3 , Issue S2: Proceedings: Microscopy & Microanalysis '97, Microscopy Society of America 55th Annual Meeting, Microbeam Analysis Society 31st Annual Meeting, Histochemical Society 48th Annual Meeting, Cleveland, Ohio, August 10-14, 1997 , August 1997 , pp. 647 - 648
Copyright
Copyright © Microscopy Society of America 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] Brydson, R.et al., J. Microsc., 177 (1994) 369.CrossRefGoogle Scholar

[2] Scheu, C.et al., J. Microsc. Microanal. Microstruct. 6 (1995) 19.CrossRefGoogle Scholar

[3] Müller, D. A.et al.Phys. Rev. Lett. 75 (1995) 4744.CrossRefGoogle Scholar

[4] Jang, H., Seidman, D. N., and Merkle, K. L., Interface Sci. 1 (1993) 61.CrossRefGoogle Scholar

[5] Chen, F. R.et al., Ultramicroscopy 54 (1994) 179.CrossRefGoogle Scholar

[6] Benedek, R.et al., Phys Rev. B 54 (1996) 7697; R. Benedek, Seidman, D. N., and Yang, L. H., to appear in Proceedings of the ASU workshop, Tempe, AZ, January 8-11, 1997 (1997).CrossRefGoogle Scholar

[7] Grioni, M.et al., Phys Rev. B 39 (1989) 1541; Grioni, M.et al., Phys Rev. B 45 (1992) 3309.CrossRefGoogle Scholar

[8] This work was supported by DOE Giants DEFG02-87ER45322 and DEFG02-96ER45597. L. H. Yang, was supported by the DOE at LLNL under contract no. W-7405-ENG-48.Google Scholar