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Characterizing InGaAs/GaAs quantum dots using low-kV FESEM imaging and EDS analysis at the nanometer scale

Published online by Cambridge University Press:  25 July 2016

Fang Zhou
Affiliation:
Carl Zeiss Microscopy GmbH, Carl-Zeiss-StraBe 22, 73447 Oberkochen, Germany
Luyang Han
Affiliation:
Carl Zeiss Microscopy GmbH, Carl-Zeiss-StraBe 22, 73447 Oberkochen, Germany
Simon Burgess
Affiliation:
Oxford Instruments NanoAnalysis, Halifax Road, High Wycombe, Bucks HP12 3SE, UK
Xiaobing Li
Affiliation:
Oxford Instruments NanoAnalysis, Halifax Road, High Wycombe, Bucks HP12 3SE, UK

Abstract

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Type
Abstract
Copyright
© Microscopy Society of America 2016 

References

References:

[1] Michler, P., Kiraz, A., Becher, C., Schoenfeld, W. V., Petroff, P. M., Zhang, L., Hu, E. & Imamoglu, A. Science 290, pp. 2282 (2000).Google Scholar
[2] Burkard, G., Loss, D. & DiVincenzo, D. P. Phys. Rev. B 59, pp. 2070 (1999).Google Scholar
[3] Maniguet, L., Roussel, F., Martin, R., Djurado, E., Steil, M.C., Bichaud, E., Le Goff, A., Holzinger, M., Cosnier, S., Chaix, J.M. & Carry, C. Microscopy and Analysis, Nanotechnology Supplement Nov/Dec (pp. 4 (2015).Google Scholar