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Characterization with TEM of AlN/GaN Heterostructures for Implant Activation Annealing

Published online by Cambridge University Press:  03 August 2008

TS Zheleva
Affiliation:
Army Research Laboratory
CE Hager
Affiliation:
Army Research Laboratory
KA Jones
Affiliation:
Army Research Laboratory
MA Derenge
Affiliation:
Army Research Laboratory
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Extract

Extended abstract of a paper presented at Microscopy and Microanalysis 2008 in Albuquerque, New Mexico, USA, August 3 – August 7, 2008

Type
Research Article
Copyright
© 2008 Microscopy Society of America

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