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Characterization of Ultra-Thin Hf-based Alternative Dielectric Layers for Si CMOS by Z-contrast Imaging and Electron Energy-Loss Spectroscopy in STEM

Published online by Cambridge University Press:  01 August 2004

Melody P Agustin
Affiliation:
University of California, Santa Barbara
Brendan Foran
Affiliation:
International Sematech, Austin, Texas
Gennadi Bersuker
Affiliation:
International Sematech, Austin, Texas
Joel Barnett
Affiliation:
International Sematech, Austin, Texas
Susanne Stemmer
Affiliation:
University of California, Santa Barbara
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Extract

Extended abstract of a paper presented at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, August 1–5, 2004.

Type
Research Article
Copyright
© 2004 Microscopy Society of America

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