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Characterization of Strontium Oxide Layers on Silicon for CMOS High-K Gate Stack Scaling

Published online by Cambridge University Press:  08 April 2017

J Bruley ,
M Frank ,
C Marchiori ,
J Fompeyrine  and
V Narayanan
J Bruley
Affiliation:
IBM
M Frank
Affiliation:
IBM
C Marchiori
Affiliation:
IBM Research, Switzerland
J Fompeyrine
Affiliation:
IBM Research, Switzerland
V Narayanan
Affiliation:
IBM

Extract

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Extended abstract of a paper presented at Microscopy and Microanalysis 2011 in Nashville, Tennessee, USA, August 7–August 11, 2011.

Type
Abstract
Information
Microscopy and Microanalysis , Volume 17 , Supplement S2 , July 2011 , pp. 1350 - 1351
Copyright
Copyright © Microscopy Society of America 2011