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The Characterization of Nano Materials in the FE-SEM

Published online by Cambridge University Press:  02 July 2020

Raynald Gauvin  and
Paula Horny
Raynald Gauvin
Affiliation:
Département de génie mécanique, Université de Sherbrooke, Sherbrooke, Québec, CanadaJ1K2R1
Paula Horny
Affiliation:
Département de génie mécanique, Université de Sherbrooke, Sherbrooke, Québec, CanadaJ1K2R1
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Extract

The observation of nano materials or nano phases is generally performed using Transmission Electron Microscopy (TEM) because conventional Scanning Electron Microscopes (SEM) do not have the resolution to image such small phases. Since the last decade, a new generation of microscopes is available on the market. These are the Field Emission Scanning Electron Microscope (FE-SEM) with a virtual secondary electron detector. The FE-SEM have a higher brightness allowing probe diameter smaller than 2.5 nm with incident electron energy, E0, below 5 keV. Furthermore, what gives FE-SEM outstanding resolution is the virtual secondary electron (SE) detector. The virtual SE detector is located above the objective lens and it is also named a through-the-lens (TTL) detector. Therefore, the SE images are mostly made up of all SE of type I and II, because those of type III, which are generated by the backscattered electrons in the chamber, are not collected.

Type
Low Voltage Scanning Electron Microscopy and X-Ray Microanalysis
Information
Microscopy and Microanalysis , Volume 6 , Issue S2: Proceedings: Microscopy & Microanalysis 2000, Microscopy Society of America 58th Annual Meeting, Microbeam Analysis Society 34th Annual Meeting, Microscopical Society of Canada/Societe de Microscopie de Canada 27th Annual Meeting, Philadelphia, Pennsylvania August 13-17, 2000 , August 2000 , pp. 744 - 745
Copyright
Copyright © Microscopy Society of America

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References

References:

Gauvin, R. et Yue, S. (1997),” The observation of NbC precipitates in steel in the nanometer range using a field emission gun scanning electron microscope”. Microscopy & Microanalysis, Vol. 3, Supp. 2, pp. 1243–1244.CrossRefGoogle Scholar
Gauvin, R. (1995), “Simulation of X-Ray and Backscattering SEM Images”, Microbeam Analysis, pp. 355–356.Google Scholar