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Characterization of Multilayered Structures Using a FEGSEM and X-Ray Microanalysis

Published online by Cambridge University Press:  02 July 2020

Raynald Gauvin ,
Mario Caron ,
Vincent Fortin  and
John F. Currie
Raynald Gauvin
Affiliation:
Département de Génie mécanique, Université de Sherbrooke, Sherbrooke, Québec, CanadaJ1K2R1
Mario Caron
Affiliation:
Noranda Advanced Materials, 4950 Lévy, Saint-Laurent, Québec, CanadaH4R2P1
Vincent Fortin
Affiliation:
LISA, Département de génie physique, École Polytechnique de Montréal, Montréal, Québec, CanadaH3V 3A7
John F. Currie
Affiliation:
LISA, Département de génie physique, École Polytechnique de Montréal, Montréal, Québec, CanadaH3V 3A7
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Extract

Microelectronic processes now involve multilayer structures of different materials. It is important to control accurately the thickness and composition of these materials during their processing. The determination of these two physical parameters are usually performed by Elastic Recoil Detection (ERD), by Auger Electron Spectroscopy (AES) and Transmission Electron Microscopy (TEM). However, these techniques are not suitable for analysis on a routine basis. In this context, a quantitative procedure based on EDS X-ray microanalysis in the Scanning Electron Microscope has been developped because of its availability and its speed of analysis. However, this technique requires several measurement of K ratio taken at different voltages which is time consuming. With the advent of Field Emission Gun Scanning Electron Microscopes (FEGSEM), X-ray line scans taken at low electron beam voltage with an EDS system may be an alternative. In this paper, preliminary results using this technique on multilayered materials are presented.

To investigate this characterization technique, a AlSiCu(200 nm)/TiN(95 nm)/Ti(40 nm) multilayer metallization structure deposited on Si substrate was used. EDS X-ray line scans were obtained with a Hitachi S-4500 FEGSEM coupled with a Link ISIS 300 EDS system.

Type
Recent Developments in Microscopy for Studying Electronic and Magnetic Materials
Information
Microscopy and Microanalysis , Volume 3 , Issue S2: Proceedings: Microscopy & Microanalysis '97, Microscopy Society of America 55th Annual Meeting, Microbeam Analysis Society 31st Annual Meeting, Histochemical Society 48th Annual Meeting, Cleveland, Ohio, August 10-14, 1997 , August 1997 , pp. 463 - 464
Copyright
Copyright © Microscopy Society of America 1997

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References

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