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Characterization of Damage in SiO2 during Helium Ion Microscope Observation by Luminescence and TEM-EELS

Published online by Cambridge University Press:  23 November 2012

S. Ogawa
Affiliation:
National Institute of Advanced Industrial Science & Technology (AIST), Tsukuba, Japan
T. Iijima
Affiliation:
National Institute of Advanced Industrial Science & Technology (AIST), Tsukuba, Japan
S. Awata
Affiliation:
HORIBA, Ltd., Kyoto, Japan
R. Sugie
Affiliation:
Toray Research Center Inc., Otsu, Japan
N. Kawasaki
Affiliation:
Toray Research Center Inc., Otsu, Japan
Y. Otsuka
Affiliation:
Toray Research Center Inc., Otsu, Japan
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Abstract

Extended abstract of a paper presented at Microscopy and Microanalysis 2012 in Phoenix, Arizona, USA, July 29 – August 2, 2012.

Type
Research Article
Copyright
Copyright © Microscopy Society of America 2012

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