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Benefits of a Cs-Corrector for Material Science

Published online by Cambridge University Press:  02 July 2020

B. Kabius ,
M. Haider ,
S. Uhlemann ,
E. Schwan ,
K. Urban  and
H. Rose
B. Kabius
Affiliation:
LEO Elektronenmikroskopie FRG, Carl-Zeiss-Str. 56, D-73447 Oberkochen / Deutschland
M. Haider
Affiliation:
CEOS Heidelberg, FRG
S. Uhlemann
Affiliation:
CEOS Heidelberg, FRG
E. Schwan
Affiliation:
CEOS Heidelberg, FRG
K. Urban
Affiliation:
Institut für Festkoerperphysik, Forschungszentrum Jülich, D-52425 Juelich, FRG
H. Rose
Affiliation:
ORNL, Oak Ridge, TN
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Abstract

One of the limiting parameters in high-resolution transmission electron microscopy (HRTEM) are the high values for the spherical aberration Cs of the objective lens, which are the reason, that for TEM's with field-emitter the point resolution at Scherzer defocus is about two times lower than the information limit. Another effect of Cs-values of about one mm is the rather large disc of least confusion, which contributes to a high amount of contrast derealization. Furthermore the images are very sensitive towards beam tilt. These disadvantages contribute to a difficult interpretation of HRTEM-images especially at interfaces and defects. In-situ applications as well as diffraction contrast experiments require a gap of at least ten mm between the pole pieces. For the present TEM's this degrades the resolution at an acceleration voltage of 200 kV to approximately 0.27 nm. Cs-correction offers the ability to combine high resolution with a large space for the sample, which can be used for in-situ experiments.

Recently, we have constructed a lens system for Cs-correction based on hexapole lenses for a commercial 200 kV instrument equipped with a field emission gun. This system allows choosing the Cs-value between +2.0 mm and -0.05 mm. The objective lens of the microscope has a Cs value of 1.2 mm resulting in a point resolution of 0.24 nm.

Type
TEM Instrument Development (Organized by D. Smith and L. Allard)
Information
Microscopy and Microanalysis , Volume 7 , Issue S2: Proceedings: Microscopy & Microanalysis 2001, Microscopy Society of America 59th Annual Meeting, Microbeam Analysis Society 35th Annual Meeting, Long Beach, California August 5-9, 2001 , August 2001 , pp. 902 - 903
Copyright
Copyright © Microscopy Society of America 2001

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References

references

1.Rose, H., Optik 85, (1990) 19–24.Google Scholar
2.Haider, M., Rose, H., Uhlemann, S., Schwan, E.., Kabius, B., Urban, K., Nature 392 (1998) 768.CrossRefGoogle Scholar