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Application of STEM EELS Quantification Relative Compositional Ratio Mapping to Characterize SiCOH - Ultra Low-k Dielectric Materials in Si-based Devices

Published online by Cambridge University Press:  25 July 2016

Wayne W. Zhao  and
Michael Gribelyuk
Wayne W. Zhao
Affiliation:
Center for Complex Analyses, GLOBALFOUNDRIES, Malta, New York, USA.
Michael Gribelyuk
Affiliation:
Advanced Technology Development, GLOBALFOUNDRIES, Malta, New York, USA.

Abstract

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Information
Microscopy and Microanalysis , Volume 22 , Supplement S3: Proceedings of Microscopy & Microanalysis 2016 , July 2016 , pp. 1532 - 1533
Copyright
© Microscopy Society of America 2016 

References

References:

[1] Zhao, W., Gribelyuk, M., et al., Microscopy & Microanalysis Vol. 21(Supplement 3 (2015). pp. 1036–1037.Google Scholar
[2] Zhao, W., et al., Microscopy & Microanalysis Vol. 20(Supplement 3 (2014). pp. 362–363.Google Scholar
[3] Zhao, W., et al, Microscopy & Microanalysis Vol. 19(Supplement 2 (2013). pp. 902–903.Google Scholar
[4] Zhao, W., Gribelyuk, M., et al., Proc. 38 th International Symposium for Testing and Failure Analysis, (2012), pp. 347~355.Google Scholar
[5] Zhao, W. Symp. Proc. the Material Research Society, 2002 Fall Meeting, (2002), Vol. 738, pp. G7.15.1~6.Google Scholar
[6] Leapman, R. & Hunt, J. Microscopy, Microanalysis, Microstructure Vol. 2 (1991). pp. 231–244.Google Scholar