No CrossRef data available.
Article contents
Application of EFTEM and XEDS Elemental Mapping to Characterization of Nanometer Devices in Semiconductor Wafer-Foundries
Published online by Cambridge University Press: 23 September 2015
Abstract
An abstract is not available for this content so a preview has been provided. As you have access to this content, a full PDF is available via the ‘Save PDF’ action button.
- Type
- Abstract
- Information
- Microscopy and Microanalysis , Volume 21 , Supplement S3: Proceedings of Microscopy & Microanalysis 2015 , August 2015 , pp. 279 - 280
- Copyright
- Copyright © Microscopy Society of America 2015
References
References:
[1]
Zhao, W., et al., Microscopy & Microanalysis Vol. 20(Supplement 3) (2014). pp 362–363.Google Scholar
[2]
Zhao, W., Gribelyuk, M., et al., Proc. 38th International Symposium for Testing and Failure Analysis (2012). pp 347–355.Google Scholar
[3]
Zhao, W., Symp. Proc. the Material Research Society, Fall Meeting (2002), Vol. 738, pp. G7.15.l~6.Google Scholar
[4]
Leapman, R. & Hunt, J., Microscopy, Microanalysis, Microstructure Vol. 2 (1991). pp 231–244.Google Scholar
[5]
Harrach, H., et al., Microscopy & Microanalysis Vol. 16(Supplement 2) (2010). pp 1312–1313.Google Scholar
[6] The authors wish to thank and acknowledge Derrick Franks for preparing this TEM sample..Google Scholar
You have
Access