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Analytical Microscopy in the Real Semiconductor Processing World

Published online by Cambridge University Press:  28 July 2005

Ron Anderson
Affiliation:
IBM Analytical Services, 1580 Route 52, Hopewell Junction, NY 12533
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Abstract

In the microelectronic semiconductor world we are bombarded with reports of how the drive toward faster, denser, lower power-consuming and more reliable semiconductor products will accelerate with time. This paper discusses the instrumental evolution from visible light microscopy to scanning electron microscopy and on to transmission electron microscopy and scanned probe microscopy. The increased demands placed on specimen preparation of precise locations in a semiconductor chip for microscopy are discussed. Analytical microscopy has to be timely in order to be a viable adjunct to semiconductor manufacturing. The factors governing analysis of turn-around time are explained and an optimum strategy is suggested for effective utilization of finite laboratory resources. The new instrumentation available to the microscopist is introduced along with an overview of the exciting new analyses that will be available in the immediate future.

Type
REVIEW
Copyright
© 2005 Microscopy Society of America

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