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Analytical Electron Microscopy Investigation of Coated 3M Nextel 720™ Fibers

Published online by Cambridge University Press:  02 July 2020

R. Nagarajan ,
A.G. Fox ,
E. Boakye  and
R.S. Hay
R. Nagarajan
Affiliation:
Department of Mechanical Engineering, Naval Postgraduate School, Monterey, CA93943-5146
A.G. Fox
Affiliation:
Department of Mechanical Engineering, Naval Postgraduate School, Monterey, CA93943-5146
E. Boakye
Affiliation:
UES, Inc., Dayton, OH45432-1894.
R.S. Hay
Affiliation:
Wright Laboratory Materials Directorate, WPAFB, Dayton, OH45433-7817.
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Extract

An oxidation resistant interfacial layer between the fiber and the matrix is important for prolonged use of ceramic-matrix composites (CMC). The interface layer has to be chemically compatible and stable in high temperature oxidizing environments. At present various oxide based interface layers in CMC are being considered. One candidate is porous interfaces. Zircon has good thermomechanical stability with SiC and mullite, and resists pore coarsening, so it is of interest as a porous interface materials.

Ethanolic zirconia and silica precursors, complexed with polyelectrolytes to form fugitive carbon for porosity were doped with vanadium. These were used to continuously coat the 3M Nextel 720™ alumina-mullite fibers. These fibers were heat-treated in-line in argon at 1000-1300°C, with the aim of finding heat-treatment conditions that would convert the zirconia, silica, and polyelectrolyte into a fine mechanical mixture of zircon and carbon.

Type
Future of Microscopy: Ceramics, Composites, and Cement
Information
Microscopy and Microanalysis , Volume 5 , Issue S2: Proceedings: Microscopy & Microanalysis '99, Microscopy Society of America 57th Annual Meeting, Microbeam Analysis Society 33rd Annual Meeting, Portland, Oregon August 1-5, 1999 , August 1999 , pp. 824 - 825
Copyright
Copyright © Microscopy Society of America

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References

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4. The authors would like to acknowledge WPAFB for financial support and E.S.K.Menon Dr. for many fruitful discussion.Google Scholar