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Analysis of H2and SiH4in the Deposition of pm-Si:H Thin Films by PECVD Process for Solar Cell Applications

Published online by Cambridge University Press:  25 July 2016

J. Plaza-Castillo
Affiliation:
Department of Physics, Universidad del Atlántico, Barranquilla, Colombia
A. García-Barrientos
Affiliation:
Faculty of Science, Universidad Autónoma de San Luis Potosí, San Luis Potosí, México
M. Moreno-Moreno
Affiliation:
Department of Electronics, INAOE, Puebla, Mexico
M. J. Arellano-Jiménez
Affiliation:
Department of Physics and Astronomy, University of Texas at San Antonio, USA
K. Y. Vizcaíno
Affiliation:
Department of Physics, Universidad del Atlántico, Barranquilla, Colombia
J.L. Bernal
Affiliation:
Mechanics Department, Universidad Politécnica de Pachuca, Hidalgo, México

Abstract

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Type
Abstract
Copyright
© Microscopy Society of America 2016 

References

[1] Singh, J., et al., “Advances in Amorphous Semiconductors”, Taylor & Francis Group, 2003.CrossRefGoogle Scholar
[2] Wenham, S. R., et al., “AppliedPhotovoltaic”, 2007.Google Scholar
[3] Swatowska, B., et al., Opto-Electronics Review Vol. 20, 168173. pp. 2012.CrossRefGoogle Scholar
[4] Ambrosio, R., et al., Journal of Alloys and Compounds Vol. 643, S27S32. pp. 2015.CrossRefGoogle Scholar
[5] Plaza-Castillo, J., et al., Microsc. Microanal. Vol. 21(Suppl 3), 297298. pp. 2015). The authors acknowledge funding from the CONACYT-Mexico, grant numbers 169062 and 204419 and PRODEP-2016.CrossRefGoogle Scholar