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An Evaluation of Image Quality Metrics for Scanning Electron Microscopy

Published online by Cambridge University Press:  25 July 2016

Matthew D. Zotta ,
Yukun Han ,
Matthew D. Bergkoetter  and
Eric Lifshin
Matthew D. Zotta
Affiliation:
College of Nanoscale Science and Engineering, SUNY Polytechnic Institute, Albany, NY, USA Nanojehm Inc., Albany, NY, USA
Yukun Han
Affiliation:
Nanojehm Inc., Albany, NY, USA
Matthew D. Bergkoetter
Affiliation:
The Institute of Optics, University of Rochester, Rochester, New York, USA
Eric Lifshin
Affiliation:
College of Nanoscale Science and Engineering, SUNY Polytechnic Institute, Albany, NY, USA

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 22 , Supplement S3: Proceedings of Microscopy & Microanalysis 2016 , July 2016 , pp. 572 - 573
Copyright
© Microscopy Society of America 2016 

References

References:

[1] Lifshin, E., et al, Microscopy and Microanalysis 20(01 (2014). p. 78–89.Google Scholar
[2] Gonzalez, R. C. in “Digital Image Processing”. Addison-Wesley, New York) p. 354.Google Scholar
[3] Joy, D. C., et al, Proc. SPIE 3998, Metrology, Inspection and Process Control for Microlithography XIV (2000). p. 108.Google Scholar
[4] Wang, Z IEEE Transactions on Image Processing, 13(04 (2004). p. 600–612.CrossRefGoogle Scholar
[5] The authors wish to thank Mr. Jeffrey Moskin, President of Nanojehm and NSF SBIR 1519678 for supporting this research.Google Scholar