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Aluminum and Tantalum Doping of Sputtered TiO2 Thin Films

Published online by Cambridge University Press:  23 September 2015

Inga Goetz ,
Rong Liu ,
Richard Wuhrer  and
Leigh Sheppard
Inga Goetz
Affiliation:
Flensburg University of Applied Sciences, Germany
Rong Liu
Affiliation:
Advanced Materials Characterisation Facility, University of Western Sydney, Australia
Richard Wuhrer
Affiliation:
SIMS Facility, University of Western Sydney, Australia
Leigh Sheppard
Affiliation:
School of Computing, Engineering, and Mathematics, University of Western Sydney, Australia

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 21 , Supplement S3: Proceedings of Microscopy & Microanalysis 2015 , August 2015 , pp. 1799 - 1800
Copyright
Copyright © Microscopy Society of America 2015 

References

References:

[1] Sheppard, L. R. & Nowotny, J., Materials for Photoelectrochemical Energy Conversion. Adv. Appl. Ceram. (2007) 106, 9–20.CrossRefGoogle Scholar
[2] Sheppard, L. R., Dittrich, T. & Nowotny, M. K.; The Impact of Niobium Surface Segregation on Charge Separation in Niobium-Doped Titanium Dioxide. J. Phys. Chem. C (2012) 116, 20923–20929.Google Scholar