Hostname: page-component-586b7cd67f-t7fkt Total loading time: 0 Render date: 2024-11-25T03:23:55.648Z Has data issue: false hasContentIssue false
  • English
  • Français

Advancements in Plasma-Based Decontamination Equipment and Related Metrology

Published online by Cambridge University Press:  05 August 2019

CA Moore  and
GJ Collins
CA Moore*
Affiliation:
Vacuum Sciences, Dana Point, CA, USA.
GJ Collins
Affiliation:
Colorado State University, Electrical and Computer Engineering, Fort Collins, CO, USA.
*
*Corresponding author: [email protected]

Abstract

An abstract is not available for this content so a preview has been provided. As you have access to this content, a full PDF is available via the ‘Save PDF’ action button.
Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Vendor Symposium
Information
Microscopy and Microanalysis , Volume 25 , Supplement S2 , August 2019 , pp. 542 - 543
Copyright
Copyright © Microscopy Society of America 2019 

References

[1]Steinbruchel, C in “Plasma Sources for Thin Film Deposition and Etching”, ed. Francombe, M. and Vossen, J., (Academic Press, New York).Google Scholar
[2]Moore, C et al. , International Workshop on EUVL (2013).Google Scholar